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  • Single Sided Polished Sapphire Wafer Dia 25.4mm, 0.43mm thickness,
1/1
  • Single Sided Polished Sapphire Wafer Dia 25.4mm, 0.43mm thickness,

Prime Grade 1 inch Sapphire Wafer C-Plane Single or Double Side Polish Al2O3 Single Crystal 1 INCH C-PLANE(0001) SAPPHIRE WAFERS

Prime Grade 1 inch Sapphire Wafer C-Plane Single or Double Side Polish Al2O3 Single Crystal 1 INCH C-PLANE(0001) SAPPHIRE WAFERS
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Prime Grade 1 inch Sapphire Wafer C-Plane Single or Double Side Polish Al2O3 Single Crystal 1 INCH C-PLANE(0001) SAPPHIRE WAFERS
Customized sapphire wafers and windows are available upon request
Sapphire is a material of a unique combination of physical, chemical and optical properties, which make it resistant to high temperature, thermal shock, water and sand erosion, and scratching. It is a superior window material for many IR applications from 3µm to 5µm. C-plane sapphire substrates are widely used to grow III-V and II-VI compounds such as GaN for blue LED and laser diodes, while R-plane sapphire substrates are used for the hetero-epitaxial deposition of silicon for microelectronic IC applications.

Features: 
All orientations are available, custom orientation is welcome;    
Wafer size from 2 to 6 inches are available for all types;
Thin wafer down to 250um for 2 inch, 300um for 4 inch and 300um for 6 inch;

 

Specification: 

Orientation R-plane, C-plane, A-plane, M-plane or a specified orientation
Orientation Tolerance ± 0.3°
Diameter 2 inches, 3 inches, 4 inches, 6 inches, 8 inches or others
Diameter Tolerance 0.1mm for 2 inches, 0.2mm for 3 inches, 0.3mm for 4 inches, 0.5mm for 6 inches
Thickness 0.25mm, 0.33mm, 0.43mm, 0.65mm, 1mm or others;
Thickness Tolerance 25μm
Primary Flat Length 16.0±1.0mm for 2 inches, 22.0±1.0mm for 3 inches, 30.0±1.5mm for 4 inches, 47.5/50.0±2.0mm for 6 inches
Primary Flat Orientation A-plane (1 1-2 0 ) ± 0.2°;  C-plane (0 0-0 1 ) ± 0.2°,  Projected C-Axis 45 +/- 2°
TTV ≤10µm for 2 inches,  ≤15µm for 3 inches,  ≤20µm for 4 inches,  ≤25µm for 6 inches
BOW ≤10µm for 2 inches,  ≤15µm for 3 inches,  ≤20µm for 4 inches,  ≤25µm for 6 inches
Front Surface Epi-Polished (Ra< 0.3nm for C-plane, 0.5nm for other orientations)
Back Surface Fine ground (Ra=0.6μm~1.4μm) or Epi-polished
Packaging Packaged in class 100 cleanroom environment


Applications: 
Growth substrate for III-V and II-VI compounds   
Electronics and optoelectronics
IR applications
Silicon On Sapphire Integrated Circuit(SOS)
Radio Frequency Integrated Circuit(RFIC)

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